Plasma Etch

Plasma etching involves RF-excitation of a selected gas mixture to create a plasma with the right reactive species to etch any un-masked areas on the wafer surface. The reactions form volatile by-products which are removed by vacuum pumping.

Omega® Etch Systems

SPTS offers advanced etch technologies for a wide range of applications within:

Omega® Rapier / DSi / DSi-v

Omega® Rapier / DSi / DSi-v

With an installed base of >1200 DRIE process modules, SPTS’s industry-leading position is spearheaded by the Rapier module, which etches Si using...

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Omega® ICP

Omega® ICP

SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and...

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Omega® Synapse™

Omega® Synapse™

Omega® Synapse™ etch process module uses a high density plasma source and is designed to etch strongly bonded...

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