HF 釋放式蝕刻

Primaxx® 蝕刻系統

SPTS 提供最廣泛的乾燥 HF 氣相釋放式蝕刻產品,從適用於研發的實驗室系統到適合量產的多腔室叢集机台,無所不包。領先業界的 Primaxx® HF 氣相蝕刻釋放技術可用於移除氧化矽犧牲層,主要作用是釋放 MEMS 裝置中的矽微結構。

專屬的乾式工藝可以避免所釋放活動零件的黏滯作用,並且避免對精緻結構造成毀損 – 這些都是傳統濕式工藝技術的常見問題。

在縮減壓力並升高溫度的情況下,結合無水 HF 氣相及酒精氣相以提供廣泛、穩定的制程窗口,可以應對不同的氧化物及厚度,同時還能維持對 MEMS 設計中其他常見材料的高選擇比,包括外露的鋁/合金特徵,例如鏡子及焊墊。

產品範圍

Primaxx® Monarch300

Primaxx® Monarch300

The Primaxx® Monarch300 is a fully integrated, automated VHF etch tool designed to perform selective MEMS etch release via a controlled...

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Primaxx® Monarch 25

Primaxx® Monarch 25

The Monarch25 is a 25-wafer batch process module designed for medium to high volume HF release etch production applications in either the...

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Primaxx® Monarch 3

Primaxx® Monarch 3

The Monarch 3 is a compact module includes a 3-wafer process chamber, and is designed for research laboratory and small volume production...

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Primaxx® uEtch

Primaxx® uEtch

SPTS's uEtch is a single-wafer system specifically designed for university and small research laboratories. Fully integrated,...

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