PECVD

Delta® 沉积系统

SPTS 的 Delta PECVD 系统可用于 MEMS、化合物半导体和先进封装中的广泛应用
 

主要优势:

  • o 晶圆尺寸支持从 75mm 至 300mm
  • o 径向对称的气流,可实现优异的晶圆片内 (WIW) 均匀性
  • o 最多可配置 10 条气体管路和可选配的集成化的液体输送系统
  • o 可配备混合频率射频功能用于应力调整
  • o 活动压印板冷却,可配备有效的加热基板冷却功能以满足关键的低温 [<175°C] 封装应用
  • o 针对除气敏感型基板可提供单片式或多片式的预加热腔体两种选项

PECVD 服务的市场:

产品图像:

Delta® PECVD

Delta® PECVD

The Delta® PECVD systems are used for a wide range of applications within MEMS, compound semiconductors, and advanced...

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